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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Compare the valence electron configuration of the nobles gas elements seen here. what statement is correct?
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Explain what happens at the saturation point when adding salt to water at room temperature.
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Describe a chemical formula give an example...
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