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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 01:30
An empty fuel tank can still contain and therefore can be even more dangerous than one full of liquid fuel.
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Chemistry, 22.06.2019 12:30
The missing component to the table to the right or indicated with orange letters complete the table by filling in the corresponding numbers or symbols
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