The atmosphere in a processing furnace for silicon-integrated circuit boards has a measured ratio h2/h20 of 105. what temperature conditions must be maintained in the furnace to prevent decomposition of the si02 insulating lay- ers previously formed on the boards

i'm assuming that the correct answer is indeed the first one/ "a"..

the enthalpy of formation of water is given as -285.8kj/mol, which states that the enthalpy of formation is negative.

negative enthalpy of formation indicates that the heat is released during the reaction process. the heat is released from reaction to the surroundings the enthalpy is expressed with a negative sign with the energy given out in the reaction process.

the formation of water takes place by giving out heat which is -285.8 kj/mol.

i dont know the answe