Answers: 2
Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
Answers: 1
Chemistry, 22.06.2019 10:30
What woukd most likely be the transmittance at a 0.70 m solution of solute a? a) 7.6%b) 1.1%c)4.0%d)4.6%
Answers: 1
Chemistry, 22.06.2019 12:00
Consider the following reaction at equilibrium. 2co2 (g) 2co (g) + o2 (g) h° = -514 kj le châtelier's principle predicts that the equilibrium partial pressure of co (g) can be maximized by carrying out the reaction a. at high temperature and high pressure b. at high temperature and low pressure c. at low temperature and low pressure d. at low temperature and high pressure e. in the presence of solid carbon
Answers: 2
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