I will give 15 points

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Choose all the answers that apply. ionic compounds dissolve easily in water do not dissolve in water have low melting points have high melting points conduct electricity when melted

The formation of a solid, also known as a is an indication of a chemical change. precipitate particulate particle powder