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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

The ozone molecule o3 has a permanent dipole moment of 1.8×10−30 cm. although the molecule is very slightly bent-which is why it has a dipole moment-it can be modeled as a uniform rod of length 2.5×10−10 m with the dipole moment perpendicular to the axis of the rod. suppose an ozone molecule is in a 8000 n/c uniform electric field. in equilibrium, the dipole moment is aligned with the electric field. but if the molecule is rotated by a small angle and released, it will oscillate back and forth in simple harmonic motion.what is the frequency f of oscillation?

What is the approximate vapor pressure when the gas condenses at 70 degrees celsius