33.7 (SI units) It is desired to etch out a region of a silicon dioxide film on the surface of a silicon wafer. The SiO2 film is 100 nm thick. The width of the etched-out area is specified to be 650 nm. (a) If the degree of anisotropy for the etchant in the process is known to be 1.25, what should be the size of the opening in the mask through which the etchant will operate

specific gravity is the density of a substance divided by the density of water. since (at standard temperature and pressure) water has a density of 1 gram/cm3, and since all of the units cancel, specific gravity is usually very close to the same value as density

so "c" is the answer

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it should be all of them because it asks if you included all of those in your answer

explanation:

the answer is option a.