B. Properties of elements repeat in a regular way as the atomic numbers increase.

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Why doesn't heat added to water make the tempature rise above 100c

Identify two types of chemical bonding in the source of dietary potassium