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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 08:30
Analyze how limestone is weathered and identify the features that are formed as a result of this dissolution
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Chemistry, 22.06.2019 16:10
Amixture initially contains a, b, and c in the following concentrations: [a] = 0.300 m , [b] = 1.05 m , and [c] = 0.550 m . the following reaction occurs and equilibrium is established: a+2b⇌c at equilibrium, [a] = 0.140 m and [c] = 0.710 m . calculate the value of the equilibrium constant, kc.
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