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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 06:00
Calculate - analysis of compound composed of iron and oxygen yields 174.86 of fe and 75.14g of o. what is the empirical formula for this compound?
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Chemistry, 23.06.2019 03:50
Show how to convert the temperature 84.7° c to kelvin. include all steps and label the final answer.
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Mathematics, 13.06.2020 03:57
Chemistry, 13.06.2020 03:57
Mathematics, 13.06.2020 03:57
Chemistry, 13.06.2020 03:57
Social Studies, 13.06.2020 03:57
Mathematics, 13.06.2020 03:57
Mathematics, 13.06.2020 03:57