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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 06:10
Explain the relationship between forward and backward reactions in equilibrium, and predict how changing the amount of a reactant (creating a tension) will affect that relationship.
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Acrystal that absorvd water from air is (blank)a. aqueousb. homogenousc. hygroscopicd. efflorescent
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Describe ciliated cell structure...
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