Mathematics, 10.05.2021 03:10 werewolf4751
In an experiment, boron is pre-deposited on a silicon substrate
with an initial concentration of 5.0 x 10^15 atoms / cm^3. Conditions are
30min at 1223K with C s = 4.5 x 10^20 atoms / cm^3. Calculate a) the value
deposited; b) a diffusion depth; c) the concentration on this
diffusion depth.
Answers: 3
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In an experiment, boron is pre-deposited on a silicon substrate
with an initial concentration of 5...
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