Calculate G system for process below, and state if the process is spontaneous or nonspontaneous. H system = -43 kJ, T = 294 K, S system = - 118 J/K 

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Consider the nuclear equation below. 239 > x + 4 he 94 2 what is x? 1.235 cm 96 2.243 u 92 3.235 u 92 4.243 cm 96

Which best explains why an iceberg floats?