A(100) silicon wafer is 700 um thick. a rectangular mask with unknown size is used to pattern the wafer before through-wafer etch. the sides of the mask window are parallel with < 110> . after through wafer etch, a window of 60um x 70um is formed on the other side of the wafer. find the size of the mask window (lwidth and length). the undercut rate is negligible.

Two flowing streams of argon gas are adiabatically mixed to form a single flow/stream. one stream is 1.5 kg/s at 400 kpa and 200 c while the second stream is 2kg/s at 500 kpa and 100 ? . it is stated that the exit state of the mixed single flow of argon gas is 150 c and 300 kpa. assuming there is no work output or input during the mixing process, does this process violate either the first or the second law or both? explain and state all your assumptions.

Slip occurs via two partial dislocations because of (a) the shorter path of the partial dislocation lines; (b) the lower energy state through partial dislocations; (c) the charge balance.

Which of the following ziegler nichols tuning methods the response of the controller to a step input should exhibit an s-shaped curve? a)-open loop mode b)-closed loop mode c)-both modes (open & closed) d)-none of the modes (open & closed)